Diffusion enhancement due to low‐energy ion bombardment during sputter etching and deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.328265
Reference46 articles.
1. The penetration of positive ions of low energy into alloys and composition changes produced in them by sputtering
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4. Auger study of preferred sputtering on binary alloy surfaces
5. Sputtering of metal alloys containing second‐phase precipitates
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