Argon-plasma-controlled optical reset in the SiO2/Cu filamentary resistive memory stack

Author:

Kawashima T.12ORCID,Yew K. S.1,Zhou Y.1,Ang D. S.1ORCID,Zhang H. Z.1,Kyuno K.3

Affiliation:

1. School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798

2. Toshiba Corporation 33, Shin-Isogo-Cho, Isogo-ku, Yokohama 235-0017, Japan

3. Shibaura Institute of Technology, 3-7-5 Toyosu, Koto-ku, Tokyo 135-8548, Japan

Funder

Toshiba Corporation - Japan

Ministry of Education - Singapore

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Reference28 articles.

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3. Nanoscale CuO solid-electrolyte-based conductive-bridging-random-access-memory cell operating multi-level-cell and 1selector1resistor

4. A. Belmonte , W. Kim , B. T. Chan , N. Heylen , A. Fantini , M. Houssa , M. Jurczak , and L. Goux , in Proceedings of IEEE International Memory Workshop (2013), p. 26.

5. J. R. Jameson , P. Blanchard , C. Cheng , J. Dinh , A. Gallo , V. Gopalakrishnan , C. Gopalan , B. Guichet , S. Hsu , D. Kamalanathan , D. Kim , F. Koushan , M. Kwan , K. Law , D. Lewis , Y. Ma , V. McCaffrey , S. Park , S. Puthenthermadam , E. Runnion , J. Sanchez , J. Shields , K. Tsai , A. Tysdal , D. Wang , R. Williams , M. N. Kozicki , J. Wang , V. Gopinath , S. Hollmer , and M. Van Buskirk , in International Electron Devices Meeting Technical Digest (2013), p. 30.1.1.

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