Laser induced pyrolytic deposition of copper from (hexafluoroacetylacetonate)(trimethylvinylsilane) copper
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.359245
Reference19 articles.
1. Photochemical generation and deposition of copper from a gas phase precursor
2. Composition, Structure, and Electric Field Variations in Photodeposition
3. LCVD of copper: Deposition rates and deposit shapes
4. Surface processes leading to carbon contamination of photochemically deposited copper films
5. High‐speed laser chemical vapor deposition of copper: A search for optimum conditions
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1. Photofragmentation Pathways and Photodeposition of Nanoparticles from a Gas Phase Copper-Containing Precursor;Inorganic Chemistry;2009-01-21
2. Recent Advances in Chemical Vapor Deposition;Current Organic Chemistry;2006-06-01
3. Removal of Copper from Silicon Surfaces Using Hexafluoroacetylacetone (hfacH) Dissolved in Supercritical Carbon Dioxide;Chemistry of Materials;2005-03-11
4. Laser chemical vapour deposition: materials, modelling, and process control;International Materials Reviews;2001-06
5. Photo-MOCVD of copper thin films using Cu(II) and Cu(I) precursors for low-temperature metallization;Advanced Materials for Optics and Electronics;2000
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