Characterization ofa‐SiC:H films produced in a standard plasma enhanced chemical vapor deposition system for x‐ray mask application
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.351471
Reference30 articles.
1. Properties and structure ofa‐SiC:H for high‐efficiencya‐Si solar cell
2. Visible-Light Injection-Electroluminescent a-SiC/p-i-n Diode
3. Amorphous SiC/Si three‐color detector
4. SiC mask membrane for synchrotron radiation lithography
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