Effect of plasma power on properties of hydrogenated amorphous silicon carbide hardmask films deposited by PECVD-Reference-Cited by-同舟云学术

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Effect of plasma power on properties of hydrogenated amorphous silicon carbide hardmask films deposited by PECVD

Published:2020-04 Issue: Volume:174 Page:109187
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Kwon Sungyool,Park Yoonsoo,Ban Wonjin,Youn Chulmin,Lee Sungwoo,Yang Jaeyoung,Jung Donggen,Choi Taekjib^ORCID

Funder

Korea Institute of Energy Technology Evaluation and Planning

Ministry of Trade, Industry &Energy (MOTIE) of the Republic of Korea

Next Generation Engineering Researcher Program of National Research Foundation of Korea

Ministry of Science, ICT

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference41 articles.

1. Comparative study on the properties of amorphous carbon layers deposited from 1-hexene and propylene for dry etch hard mask application in semiconductor device manufacturing;Lee;Thin Solid Films,2011

2. Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating;Liu;Proc. SPIE,2003

3. International Roadmap for Devices and Systems (IRDS),2018

4. Low-stress PECVD SiC thin films for IC-compatible microstructures;Sarro;Sens. Actuators.A: Phys,1998

5. Hardness and Young's modulus of amorphous a-SiC thin films determined by nanoindentation and bulge tests;El Khakani;J. Mater. Res.,1994

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