Plasma influence in tantalum sputtering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.323960
Reference14 articles.
1. A NEW STRUCTURE IN TANTALUM THIN FILMS
2. Phases Observed in Oxygen‐Reactive Sputtering of Tantalum
3. Abstracts from the Proceedings of the Conference on Thin Film Phenomena
4. Structure and electrical properties of Ta films sputtered in ArO2
5. Role of surface hydroxyls in the nucleation of sputtered tantalum films
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Influence of substrate movement on the ITO film thickness distribution during magnetron sputtering;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-11
2. Structural and Electronic Properties of Pure Ta, TaNO, and TaZrNO with Ab Initio Calculations;ISRN Metallurgy;2012-12-17
3. Design and fabrication of ultrathin and highly thermal-stable α-Ta/graded Ta(N)/TaN multilayer as diffusion barrier for Cu interconnects;Journal of Physics D: Applied Physics;2011-02-02
4. Phase transformation of tantalum on different dielectric films with plasma treatment;Thin Solid Films;2006-03
5. The structure and stability of β-Ta thin films;Thin Solid Films;2005-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3