Role of the substrate strain in the sheet resistance stability of NiSi deposited on Si(100)
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.369774
Reference25 articles.
1. Expitaxial metal–semiconductor structures and their properties
2. Nucleation of new solid phases from chemical interactions at an interface
3. Formation of thin films of NiSi: Metastable structure, diffusion mechanisms in intermetallic compounds
4. Nickel silicide thermal stability on polycrystalline and single crystalline silicon
5. XPS study of the chemical structure of the nickel/silicon interface
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