Analytical compensation of stray capacitance effect in Kelvin probe measurements
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1146098
Reference30 articles.
1. LVII. On the charge of electricity carried by the ions produced by Röntgen rays
2. Measurement of Surface Fermi Level in Phosphidized GaAs
3. Gas adsorption studies of sputtered amorphous hydrogenated carbon films
4. Work Function of Iron Surfaces Produced by Cleavage in Vacuum
5. A Direct Comparison of the Kelvin and Electron Beam Methods of Contact Potential Measurement
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