Effects of plasma and vacuum-ultraviolet exposure on the mechanical properties of low-k porous organosilicate glass
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4891501
Reference39 articles.
1. Low dielectric constant materials for microelectronics
2. Characterization of Nanoporous Low-k Thin Films by Small-Angle Neutron Scattering Contrast Variation
3. Plasma enhanced chemical vapor deposited SiCOH dielectrics: from low-kto extreme low-kinterconnect materials
4. Low and Ultralow Dielectric Constant Films Prepared by Plasma-enhanced Chemical Vapor Deposition
5. Plasma processing of low-k dielectrics
Cited by 26 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Chemical structure characteristics of flexible low-k SiCOH thin films etched by inductively coupled plasma-reactive ion etching process using FTIR and XPS spectra analysis;Microelectronic Engineering;2024-09
2. Evaluation modified luffa with silver nanoparticles (LF/AgNPs) for removal of a nonsteroidal anti-inflammatory (IBUPROFEN) from aqueous media;Environmental Nanotechnology, Monitoring & Management;2023-12
3. Structural and Luminescence Properties of Eu-Doped PMO Films with Ethylene Bridge and Methyl Terminal Groups;Coatings;2023-09-21
4. Etching characteristics of low-k SiCOH thin films under fluorocarbon-based plasmas;Vacuum;2022-08
5. Etch Characteristics of Low-K Materials Using CF3I/C4F8/Ar/O2 Inductively Coupled Plasmas;Science of Advanced Materials;2022-07-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3