Growth kinetics and inhibition of growth of chemical vapor deposited thin tungsten films on silicon from tungsten hexafluoride
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.351879
Reference16 articles.
1. Selective Low Pressure Chemical Vapor Deposition of Tungsten
2. The Kinetics of LPCVD Tungsten Deposition in a Single Wafer Reactor
3. Selective chemical vapor deposition of tungsten using WF6and GeH4
4. The interaction of WF6 with Si(100); thermal and photon induced reactions
5. Mechanism for chemical‐vapor deposition of tungsten on silicon from tungsten hexafluoride
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