Development of 1.2-GHz ECR ion source and Wien filter for inexpensive ion beam processing system-Reference-Cited by-同舟云学术

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Development of 1.2-GHz ECR ion source and Wien filter for inexpensive ion beam processing system

Published:2019-12-01 Issue:12 Volume:90 Page:123508
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Asaji Toyohisa¹,Uyama Hiroya¹,Umetsugu Takuro¹,Nakamura Tsubasa²,Hitobo Takeshi³,Kato Yushi⁴

Affiliation:

1. National Institute of Technology, Toyama College, 13 Hongo-machi, Toyama City, Toyama 939-8630, Japan

2. National Institute of Technology, Oshima College, 1091-1 Komatsu, Suouoshima, Yamaguchi 742-2193, Japan

3. Tateyama Machine Co., Ltd., 30 Shimonoban, Toyama City, Toyama 930-1305, Japan

4. Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan

Funder

Japan Society for the Promotion of Science

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5127348

Reference9 articles.

1. Polymer surface morphology control by reactive ion etching for microfluidic devices

2. Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF4 and O2

3. Thermal reactive ion etching technique involving use of self-heated cathode

4. The compact electron cyclotron resonance ion source KeiGM for the carbon ion therapy facility at Gunma University

5. Development of portable mass spectrometer with electron cyclotron resonance ion source for detection of chemical warfare agents in air

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