Interfacial stability of an indium tin oxide thin film deposited on Si and Si0.85Ge0.15
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1288694
Reference15 articles.
1. Thermodynamic considerations in refractory metal‐silicon‐oxygen systems
2. Two mask step polysilicon TFT technology for flat panel displays
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4. The interfaces a-Si:H/Pd and a-Si:H/ITO: Structure and electronic properties
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