Threshold voltage instability of p-channel metal-oxide-semiconductor field effect transistors with hafnium based dielectrics
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2719022
Reference15 articles.
1. Proceedings of the 11th International Symposium on Physical and Failure Analysis of IC;Groeseneken G.,2004
2. Special reliability features for Hf-based high-/spl kappa/ gate dielectrics
3. Proceedings of the International Reliability Physics Symposium;Kerber A.,2003
4. Effect of Pre-Existing Defects on Reliability Assessment of High-K Gate Dielectrics
5. Effects of ALD HfO2 thickness on charge trapping and mobility
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