The structural and optical properties ofa‐SiNx:H prepared by plasma‐enhanced chemical‐vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.351992
Reference18 articles.
1. Characterization of Silicon Nitride Films
2. Properties of Amorphous Films Prepared from SiH4-N2-H2Gas Mixture
3. Nitrogen-bonding environments in glow-discharge—depositeda−Si:Hfilms
4. Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition
5. Optical dielectric function and infrared absorption of hydrogenated amorphous silicon nitride films: Experimental results and effective-medium-approximation analysis
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