Photographic Emulsion Relief Technique for Small‐Area Intensity Comparisons-Reference-Cited by-同舟云学术

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Photographic Emulsion Relief Technique for Small‐Area Intensity Comparisons

Published:1966-08 Issue:9 Volume:37 Page:3633-3634
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Juleff E. M.,Lapierre A. G.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1708920

Reference2 articles.

1. Observation of Locally Diffused Regions in Silicon Wafers by Berg‐Barrett X‐Ray Diffraction Micrography

2. The Application of Berg-Barrett Skew Reflections for Observing Boron Diffusion-induced Imperfections in Silicon Wafers †

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. TECHNIQUES AND INTERPRETATION IN X-RAY TOPOGRAPHY;Diffraction and Imaging Techniques in Material Science;1978

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