Online tuning of impedance matching circuit for long pulse inductively coupled plasma source operation—An alternate approach
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4863098
Reference21 articles.
1. Experiments on Ion Cyclotron Resonance
2. Review of inductively coupled plasmas for plasma processing
3. Power deposition in high‐density inductively coupled plasma tools for semiconductor processing
4. Overview of the RF source development programme at IPP Garching
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