Sources of optical absorption between 5.7 and 5.9eV in silica implanted with Si or O-Reference-Cited by-同舟云学术

Sources of optical absorption between 5.7 and 5.9eV in silica implanted with Si or O

Published:2006-08 Issue:3 Volume:100 Page:033517
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Magruder R. H.,Stesmans A.,Clémer K.,Weeks R. A.,Weller R. A.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2226196

Reference54 articles.

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2. Effects of fluorine dimer excimer laser radiation on the optical transmission and defect formation of various types of synthetic SiO2 glasses

3. H2OandO2molecules in amorphousSiO2:Defect formation and annihilation mechanisms

4. The structure, properties, and dynamics of oxygen vacancies in amorphous SiO/sub 2/

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