Experimental and theoretical study of the crystallization of chemical‐vapor‐deposited mixed‐phase silicon films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.357781
Reference18 articles.
1. High performance low-temperature poly-Si n-channel TFTs for LCD
2. Large grain polycrystalline silicon by low‐temperature annealing of low‐pressure chemical vapor deposited amorphous silicon films
3. Structure of As‐Deposited LPCVD Silicon Films at Low Deposition Temperatures and Pressures
4. Structure and crystal growth of atmospheric and low‐pressure chemical‐vapor‐deposited silicon films
5. The Effect of Low Pressure on the Structure of LPCVD Polycrystalline Silicon Films
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