High-throughput deterministic plasma etching using array-type plasma generator system-Reference-Cited by-同舟云学术

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High-throughput deterministic plasma etching using array-type plasma generator system

Published:2021-12-01 Issue:12 Volume:92 Page:125107
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Sano Yasuhisa¹^ORCID,Nishida Ken¹,Asada Ryohei¹,Okayama Shinya¹,Toh Daisetsu¹^ORCID,Matsuyama Satoshi¹²^ORCID,Yamauchi Kazuto¹³^ORCID

Affiliation:

1. Division of Precision Engineering and Applied Physics, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan

2. Department of Materials Physics, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603, Japan

3. Research Center for Precision Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan

Funder

Japan Science and Technology Agency

Publisher

AIP Publishing

Subject

Instrumentation

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0071623

Reference24 articles.

1. Acoustic Wave Filter Technology–A Review

2. Improvement of total quality on EUV mask blanks toward volume production

3. The next ten years of X-ray science

4. Influence of nonuniformity in sapphire substrates for a gravitational wave telescope

5. Chemical Mechanical Planarization: Slurry Chemistry, Materials, and Mechanisms

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