Deposition rate in modulated radio-frequency silane plasmas
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.126235
Reference9 articles.
1. Effect of pulse parameters on the deposition rate of hydrogenated amorphous silicon in a modified pulsed plasma discharge
2. Optoelectronic properties of hydrogenated amorphous silicon films grown using a modified pulsed plasma discharge
3. Study of Deposition Process in Modulated RF Silane Plasma
4. High Deposition Rate Amorphous Silicon Solar Cells and Thin Film Transistors Using the Pulsed Plasma Pecvd Technique
5. Low temperature pulsed plasma deposition. Part I—a new technique for thin film deposition with complete gas dissociation
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