Study of Deposition Process in Modulated RF Silane Plasma-Reference-Cited by-同舟云学术

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Study of Deposition Process in Modulated RF Silane Plasma

Published:1994-07-30 Issue:Part 1, No. 7B Volume:33 Page:4389-4394
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kirimura Hiroya,Maeda Hiroshi,Murakami Hiroshi,Nakahigashi Takahiro,Ohtani Satoshi,Tabata Takao,Hayashi Tsukasa,Kobayashi Masanao,Mitsuda Yoshie,Nakamura Nobuyuki,Kuwahara Hajime,Doi Akira

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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