Modified Stoney formula for determining stress within thin films on large-deformation isotropic circular plates-Reference-Cited by-同舟云学术

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Modified Stoney formula for determining stress within thin films on large-deformation isotropic circular plates

Published:2021-12-01 Issue:12 Volume:11 Page:125009
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Liu Haijun¹²^ORCID,Dai Minghui¹,Tian Xiaoqing¹²,Chen Shan¹²^ORCID,Dong Fangfang¹²,Lu Lei³

Affiliation:

1. School of Mechanical Engineering, Hefei University of Technology, Hefei 230009, People’s Republic of China

2. Anhui Engineering Laboratory of Intelligent CNC Technology and Equipment, Hefei 230009, People’s Republic of China

3. Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215021, People’s Republic of China

Funder

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0073795

Reference23 articles.

1. Thin films residual stress profile evaluation using test microstructures: Illustrated on an example of AlN film

2. In Situ Substrate Curvature Measurement of BaTiO3 Films Deposited by Aerosol Deposition

3. Modified Stoney’s equation with anisotropic substrates undergoing large deformations

4. An extended Stoney's formula including nonlinear deformation for large size wafer of multilayers with arbitrary thicknesses

5. Nonparametric estimation of SiC film residual stress from the wafer surface profile

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