Nitridation effects on Pb center structures at SiO2/Si(100) interfaces
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1687034
Reference28 articles.
1. Role of interfacial nitrogen in improving thin silicon oxides grown in N2O
2. Monolayer incorporation of nitrogen at Si–SiO2 interfaces: Interface characterization and electrical properties
3. Correlation of dielectric breakdown with hole transport for ultrathin thermal oxides and N2O oxynitrides
4. Profiling nitrogen in ultrathin silicon oxynitrides with angle-resolved x-ray photoelectron spectroscopy
5. Capture and tunnel emission of electrons by deep levels in ultrathin nitrided oxides on silicon
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1. Interface traps responsible for negative bias temperature instability in a nitrided submicron metal-oxide-semiconductor field effect transistor;Applied Physics Letters;2011-03-07
2. Location, Structure, and Density of States of NBTI-Induced Defects in Plasma Nitrided pMOSFETs;2007 IEEE International Reliability Physics Symposium Proceedings. 45th Annual;2007-04
3. Response to “Comment on ‘Nitridation effects on Pb center structures at SiO2∕Si(100) interfaces’ ” [J. Appl. Phys. 95, 4096 (2004)];Journal of Applied Physics;2007-01-15
4. Comment on “Nitridation effects on Pb1 center structures at SiO2∕Si(100) interfaces” [J. Appl. Phys. 95, 4096 (2004)];Journal of Applied Physics;2007-01-15
5. The impact of negative-bias-temperature-instability on the carrier generation lifetime of metal-oxynitride-silicon capacitors;Journal of Applied Physics;2006-12-15
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