Spatial distribution of the absolute densities of CFx radicals in fluorocarbon plasmas determined from single-path infrared laser absorption and laser-induced fluorescence-Reference-Cited by-同舟云学术

Spatial distribution of the absolute densities of CFx radicals in fluorocarbon plasmas determined from single-path infrared laser absorption and laser-induced fluorescence

Published:2001-07-15 Issue:2 Volume:90 Page:580-586
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Nakamura Masayuki,Hori Masaru,Goto Toshio,Ito Masafumi,Ishii Nobuo

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1337090

Reference14 articles.

1. Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

2. Fluorocarbon radicals and surface reactions in fluorocarbon high density etching plasma. II. H2 addition to electron cyclotron resonance plasma employing CHF3

3. Radical Behavior in Inductively Coupled Fluorocarbon Plasma forSiO2Etching

4. CF3,CF2and CF Radical Measurements in RFCHF3Etching Plasma Using Infrared Diode Laser Absorption Spectroscopy

5. Fluorocarbon radicals and surface reactions in fluorocarbon high density etching plasma. I. O2 addition to electron cyclotron resonance plasma employing CHF3

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