UV laser‐generated fluorine atom etching of polycrystalline Si, Mo, and Ti
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.95518
Reference18 articles.
1. Laser‐induced microscopic etching of GaAs and InP
2. Effect of the laser radiation intensity on the kinetics of the heterogeneous photochemical reaction between single-crystal germanium and bromine gas
3. Effect of the laser radiation intensity on the kinetics of the heterogeneous photochemical reaction between single-crystal germanium and bromine gas
4. Effect of the laser radiation intensity on the kinetics of the heterogeneous photochemical reaction between single-crystal germanium and bromine gas
5. Surface Etching by Laser‐Generated Free Radicals
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