A rapid reflectance-difference spectrometer for real-time semiconductor growth monitoring with sub-second time resolution
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4760252
Reference19 articles.
1. Anisotropies in the Above—Band-Gap Optical Spectra of Cubic Semiconductors
2. Above-bandgap optical anisotropies in cubic semiconductors: A visible–near ultraviolet probe of surfaces
3. Aspects of reflectance anisotropy spectroscopy from semiconductor surfaces
4. Reflection anisotropy spectroscopy
5. Stress-induced optical anisotropies measured by modulated reflectance
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1. Normal-incidence reflectance difference spectroscopy based on a liquid crystal variable retarder;Applied Optics;2016-11-11
2. A multichannel reflectance anisotropy spectrometer for epitaxial growth monitoring;Measurement Science and Technology;2015-10-12
3. Reflectance-difference spectroscopy as a probe for semiconductor epitaxial growth monitoring;Journal of Crystal Growth;2015-09
4. Characterization of Si3N4/Si(111) thin films by reflectance difference spectroscopy;Japanese Journal of Applied Physics;2015-01-14
5. Real-time reflectance-difference spectroscopy of GaAs molecular beam epitaxy homoepitaxial growth;APL Materials;2014-03
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