Heteroepitaxial growth of sixfold symmetric osmium on Si (111) and Si (100)
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2711658
Reference15 articles.
1. Magnetotransport and microstructure of annealed magnetic tunnel junctions
2. Material Consideration on Ta, Mo, Ru, and Os as Glue Layer for Ultra Large Scale Integration Cu Interconnects
3. Osmium Barriers for Direct Copper Electrodeposition in Damascene Processing
4. Effects of an Os layer on the magnetic properties of CoFe∕IrMn
5. (100) and (111) Ni films epitaxially grown on Cu by the metal–metal epitaxy on silicon technique near room temperatures
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1. Effects of Os Inserted Layers on the Microstructures and Magnetic Properties of the FePt Films;Journal of Nanoscience and Nanotechnology;2011-12-01
2. Microstructure and Magnetic Properties of Multilayer [FePt/Os]n Films;Nanoscience and Nanotechnology Letters;2011-04-01
3. Microstructure and ordering parameter studies in multilayer [FePt(x)/Os]n films;Journal of Applied Physics;2011-04
4. Magnetic Properties of Multilayer ${[({\rm FePt})_{\rm x}/{\rm Os}]}_{\rm n}$ Films;IEEE Transactions on Magnetics;2010-06
5. Effects of os inserted layers on the structures and magnetic properties of the FePt film;2010 3rd International Nanoelectronics Conference (INEC);2010-01
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