Influence of HF‐H2O2treatment on Si(100) and Si(111) surfaces
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.354821
Reference20 articles.
1. Unusually Low Surface-Recombination Velocity on Silicon and Germanium Surfaces
2. Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy
3. Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphology
4. Electron-energy-loss characterization of the H-terminated Si(111) and Si(100) surfaces obtained by etching in NH4F
5. Morphology of hydrogen-terminated Si(111) and Si(100) surfaces upon etching in HF and buffered-HF solutions
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