Structural properties of amorphous silicon carbide films by plasma‐enhanced chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.359006
Reference14 articles.
1. Electrical and optical properties of amorphous silicon carbide, silicon nitride and germanium carbide prepared by the glow discharge technique
2. Improvement of carrier injection efficiency in a-SiC p-i-n LED using highly-conductive wide-gap p, n type a-SiC prepared by ECR CVD
3. High Performance A–Si Solar Cells and Narrow Bandgap Materials
4. Properties of hydrogenated amorphous silicon carbide films prepared by plasma-enhanced chemical vapor deposition
5. Infrared absorption of hydrogenated amorphous SiC and GeC films
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