Platinum(100) hillock growth in a Pt/Ti electrode stack for ferroelectric random access memory
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1610809
Reference10 articles.
1. Fatigue-free ferroelectric capacitors with platinum electrodes
2. Characteristics of Bismuth LayeredSrBi2Ta2O9Thin-Film Capacitors and Comparison withPb(Zr,Ti)O3
3. Formation of high adhesive and pure Pt layers on TiO2
4. Intrinsic stress dependence of Pt hillock formation and its related electrical properties of SBT capacitor
5. Platinum Hillocks in Pt/Ti Film Stacks Deposited on Thermally Oxidized Si Substrate
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