Morphological and phase stability of nickel–germanosilicide on Si1−xGex under thermal stress
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1522491
Reference34 articles.
1. Silicides and local interconnections for high-performance VLSI applications
2. Silicides for integrated circuits: TiSi2 CoSi2
3. Self-aligned CoSi/sub 2/ for 0.18 μm and below
4. Analysis of resistance behavior in Ti- and Ni-salicided polysilicon films
5. Reduction of the C54–TiSi2 phase transformation temperature using refractory metal ion implantation
Cited by 79 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. New insights on Ni-Si system for microelectronics applications;Microelectronic Engineering;2022-08
2. Impact of the Si Content on the Electrical Properties of NiSi x Ge1–x Source/Drain Contact Metal for Ge pMOSFETs;IEEE Transactions on Electron Devices;2021-11
3. In‐Situ Observation of the Formation of NiSi/Ni 2 Si Heterojunction in SiGe Nanowire with Al 2 O 3 Diffusion Barrier Layer;Advanced Materials Interfaces;2021-06-25
4. (Invited) Impact of Some Processing Steps onto the Strain Distributions in FD-SOI CMOS Planar Devices: A Contribution of Dark-Field Electron Holography;ECS Transactions;2018-07-23
5. Pulsed Laser Annealing Technology for Nano-Scale Fabrication of Silicon-Based Devices in Semiconductors ☆;Advances in Laser Materials Processing;2018
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3