(Invited) Impact of Some Processing Steps onto the Strain Distributions in FD-SOI CMOS Planar Devices: A Contribution of Dark-Field Electron Holography
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Published:2018-07-23
Issue:10
Volume:86
Page:37-50
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ISSN:1938-6737
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Container-title:ECS Transactions
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language:en
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Short-container-title:ECS Trans.
Author:
Boureau Victor,Benoit Daniel,Claverie Alain
Publisher
The Electrochemical Society