Experimental characteristics of rf parallel‐plate discharges: Influence of attaching gases
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345291
Reference24 articles.
1. Impedance characteristics of an rf parallel plate discharge and the validity of a simple circuit model
2. Electrical Properties of RF Sputtering Systems
3. Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF Discharges
4. Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF Discharges
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