An ultra-high vacuum system for fabricating clean two-dimensional material devices

Author:

Guo Shuaifei12345ORCID,Luo Mingyan12345ORCID,Shi Gang6ORCID,Tian Ning12345,Huang Zhe7,Yang Fangyuan1ORCID,Ma Liguo1ORCID,Wang Nai Zhou89ORCID,Shi Qinzhen10ORCID,Xu Kailiang1011ORCID,Xu Zihan12ORCID,Watanabe Kenji13ORCID,Taniguchi Takashi14ORCID,Chen Xian Hui89ORCID,Shen Dawei7ORCID,Zhang Liyuan6,Ruan Wei1345ORCID,Zhang Yuanbo12345ORCID

Affiliation:

1. State Key Laboratory of Surface Physics and Department of Physics, Fudan University 1 , Shanghai 200438, China

2. Shanghai Qi Zhi Institute 2 , Shanghai 200232, China

3. Shanghai Research Center for Quantum Sciences 3 , Shanghai 201315, China

4. Institute for Nanoelectronic Devices and Quantum Computing, Fudan University 4 , Shanghai 200433, China

5. Zhangjiang Fudan International Innovation Center, Fudan University 5 , Shanghai 201210, China

6. Department of Physics, Southern University of Science and Technology 6 , 518055 Shenzhen, China

7. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology (SIMIT), Chinese Academy of Sciences 7 , Shanghai 200050, China

8. Hefei National Laboratory for Physical Science at Microscale and Department of Physics, University of Science and Technology of China 8 , Hefei, Anhui 230026, China

9. Key Laboratory of Strongly Coupled Quantum Matter Physics, University of Science and Technology of China 9 , Hefei, Anhui 230026, China

10. Center for Biomedical Engineering, Fudan University 10 , Shanghai 200438, China

11. Academy for Engineering and Technology, Fudan University 11 , Shanghai, China

12. SixCarbon Technology, Youmagang Industry Park 12 , Shenzhen 518106, China

13. Research Center for Functional Materials, National Institute for Materials Science 13 , 1-1 Namiki, Tsukuba 305-0044, Japan

14. International Center for Materials Nanoarchitectonics, National Institute for Materials Science 14 , 1-1 Namiki, Tsukuba 305-0044, Japan

Abstract

High mobility electron gases confined at material interfaces have been a venue for major discoveries in condensed matter physics. Ultra-high vacuum (UHV) technologies played a key role in creating such high-quality interfaces. The advent of two-dimensional (2D) materials brought new opportunities to explore exotic physics in flat lands. UHV technologies may once again revolutionize research in low dimensions by facilitating the construction of ultra-clean interfaces with a wide variety of 2D materials. Here, we describe the design and operation of a UHV 2D material device fabrication system, in which the entire fabrication process is performed under pressure lower than 5 × 10−10 mbar. Specifically, the UHV system enables the exfoliation of atomically clean 2D materials. Subsequent in situ assembly of van der Waals heterostructures produces high-quality interfaces that are free of contamination. We demonstrate functionalities of this system through exemplary fabrication of various 2D materials and their heterostructures.

Funder

National Key Research and Development Program of China

National Science Fund for Distinguished Young Scholars

China National Funds for Distinguished Young Scientists

Strategic Priority Research Program of Chinese Academy of Sciences

Shenzhen Distinguished Young Scholar Award

Japan Society for the Promotion of Science

Publisher

AIP Publishing

Subject

Instrumentation

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