Sulfur doping behavior of gallium antimonide grown by molecular‐beam epitaxy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.340251
Reference15 articles.
1. Preparation of 1.78‐μm wavelength Al0.2Ga0.8Sb/GaSb double‐heterostructure lasers by molecular beam epitaxy
2. Room Temperature CW Operation of GaSb/AlGaSb MQW Laser Diodes Grown by MBE
3. Molecular Beam Epitaxy of GaSb and GaSbxAs1-x
4. Summary Abstract: Controlled n-type doping of GaSb
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1. Surface morphology, electrical and optical properties n-type doped MOCVD grown GaSb using dimethyltellurium;International Journal of Materials Research;2011-11-01
2. Sulphur doping of GaSb grown by atmospheric pressure MOVPE;Journal of Crystal Growth;1998-01
3. The physics and technology of gallium antimonide: An emerging optoelectronic material;Journal of Applied Physics;1997-05
4. Electrical and microstructure analysis of ohmic contacts to p- and n-type GaSb, grown by molecular beam epitaxy;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-11
5. New donor doping sources for molecular beam epitaxy of AlGaSb and AlGaAs;Materials Science and Technology;1996-02
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