Thermal stability and diffusion in gadolinium silicate gate dielectric films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1412284
Reference20 articles.
1. High-κ gate dielectrics: Current status and materials properties considerations
2. Thermodynamic stability of binary oxides in contact with silicon
3. Hafnium and zirconium silicates for advanced gate dielectrics
4. Hafnium and zirconium silicates for advanced gate dielectrics
5. Ultrathin zirconium silicate film with good thermal stability for alternative gate dielectric application
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