Roughness evolution in polyimide films during plasma etching
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1364507
Reference11 articles.
1. Polymer-based waveguide devices for WDM applications
2. Effect of side wall roughness in buried channel waveguides
3. Roughening in Plasma Etch Fronts of Si(100)
4. Optimized Oxygen Plasma Etching of Polyurethane‐Based Electro‐optic Polymer for Low Loss Optical Waveguide Fabrication
5. Loss mechanisms in polyimide waveguides
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