Optimized Oxygen Plasma Etching of Polyurethane‐Based Electro‐optic Polymer for Low Loss Optical Waveguide Fabrication-Reference-Cited by-同舟云学术

Optimized Oxygen Plasma Etching of Polyurethane‐Based Electro‐optic Polymer for Low Loss Optical Waveguide Fabrication

Published:1996-11-01 Issue:11 Volume:143 Page:3648-3651
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Chen Antao¹²³,Kaviani Kian¹²³,Rempel Aron W.¹²³,Kalluri Srinath¹²³,Steier William H.¹²³,Shi Yongqiang¹²³,Liang Zhiyong¹²³,Dalton Larry R.¹²³

Affiliation:

1. Department of Electrical Engineering‐Electrophysics, University of Southern California, Los Angeles, California 90089‐0483

2. Tacoan Corporation, Carlsbad, California 92008

3. Department of Chemistry, University of Southern California, Los Angeles, California 90089‐1661

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1837265/pdf

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