Beam induced deposition of an ultraviolet transparent silicon oxide film by focused gallium ion beam-Reference-Cited by-同舟云学术

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Beam induced deposition of an ultraviolet transparent silicon oxide film by focused gallium ion beam

Published:1996-02-05 Issue:6 Volume:68 Page:732-734
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Ogasawara M.,Kariya M.,Nakamura H.,Komano H.,Inoue S.,Sugihara K.,Hayasaka N.,Horioka K.,Takigawa T.,Okano H.,Mori I.,Yamazaki Y.,Miyoshi M.,Watanabe T.,Okumura K.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.116724

Reference6 articles.

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Miniaturization process of three-dimensional nanostructures fabricated by focused-ion-beam chemical vapor deposition;Japanese Journal of Applied Physics;2021-11-22

2. Experiments and simulation of the secondary effect during focused Ga ion beam induced deposition of adjacent nanostructures;Materials & Design;2021-11

3. Recent Development in Focused Ion Beam Nanofabrication;Comprehensive Nanoscience and Nanotechnology;2019

4. Approaching the resolution limit of W-C nano-gaps using focused ion beam chemical vapour deposition;Applied Surface Science;2018-01

5. Superconductivity in Tungsten-Carbide Nanowires Deposited from the Mixtures of W(CO)6and C14H10;Japanese Journal of Applied Physics;2013-07-01

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