Characterization of the Si:H network during transformation from amorphous to micro- and nanocrystalline structures
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2384812
Reference40 articles.
1. Deposition of phosphorus doped microcrystalline silicon below 70 °C at 70 MHz
2. Device grade microcrystalline silicon owing to reduced oxygen contamination
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4. Effect of hydrogen dilution on the structure of amorphous silicon alloys
5. Heterogeneity in microcrystalline-transition state: Origin of Si-nucleation and microcrystallization at higher rf power from Ar-diluted SiH4 plasma
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