Photochemical etching of silicon using monochromatic synchrotron radiation
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.112668
Reference17 articles.
1. Photostimulated evaporation of SiO2 and Si3N4 films by synchrotron radiation and its application for low‐temperature cleaning of Si surfaces
2. Etching of SiO[sub 2] film by synchrotron radiation in hydrogen and its application to low-temperature surface cleaning
3. Synchrotron radiation-assisted etching of Si in the presence of reactive species produced by microwave discharge
4. Oxygen addition effects in synchrotron radiation excited etching using SF6
5. Synchrotron Radiation‐Excited Chemical Vapor Deposition of Silicon Nitride Films from a SiH4 + NH 3 Gas Mixture
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. New microfabrication technique on a submicrometer scale by synchrotron radiation-excited etching;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-11
2. Modification of surface condition and irradiation effects of synchrotron radiation on photoexcited etching of SiC;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1995-11
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