Fabrication of midgap metal gates compatible with ultrathin dielectrics
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.122242
Reference4 articles.
1. CMOS scaling into the 21st century: 0.1 µm and beyond
2. The Deposition of Molybdenum and Tungsten Films from Vapor Decomposition of Carbonyls
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