The impact of S vacancies on the modulation of the work function and Schottky barrier at the Au/MoS2 interface

Author:

Xie Duxing1,Yang Fengzhen1,Qiu Xu1,Hu Yuhao1,Sun Yi1,He Shuang1ORCID,Wang Xiufeng1ORCID

Affiliation:

1. School of Materials Science and Engineering, Xiangtan University , 411105 Xiangtan, China

Abstract

The S vacancy at metal/MoS2 interface plays a much important role than the semiconductor itself. In this work, the influence of different configurations of S vacancy concentrations on the effective work function and band structure of the Au/MoS2 interface has been investigated systematically using first-principles calculations. The study specifically explores the effective work function of the Au/MoS2 interface, the deviation of interface effects from the vacuum work function, and the dipole moment caused by interface charge transfer. The results reveal that the electronic work function of Au/MoS2 increases with the increase in S vacancy concentration, but the rate of increase tends to slow down with higher S concentrations. The variation in the effective work function of the Au/MoS2 interface may be attributed to the presence of S vacancies and the exposure of Mo atoms. S vacancies lead to a reduction in the Schottky barrier, resulting in increased leakage current. The Fermi pinning caused by S vacancy concentration and location is also observed. The results obtained in this study can serve as a theoretical foundation for applications in electronic devices that rely on metal/MoS2 contact.

Funder

National Natural Science Foundation of China

Natural Science Foundation of Hunan Province

Publisher

AIP Publishing

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