Electronic and optical properties of amorphous Si:H films deposited by chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.93414
Reference13 articles.
1. Solar cells using discharge-produced amorphous silicon
2. Horizontally multi-layered a-Si photo-voltaic cells A new type of high voltage photo-voltaic device
3. Amorphous‐silicon thin‐film metal‐oxide‐semiconductor transistors
4. A-Si thin film as a photo-receptor for electrophotography
5. Doped amorphous semiconductors
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1. Growth chemistry of amorphous silicon and amorphous silicon–germanium alloys;Current Opinion in Solid State and Materials Science;2002-10
2. Kinetics of Crystallization of Amorphous and Mixed-Phase Silicon Films Deposited by Pyrolysis of Disilane Gas at Very Low Pressure;Japanese Journal of Applied Physics;1995-06-01
3. Deposition and Crystallisation Behaviour of Amorphous Silicon Thin Films Obtained by Pyrolysis of Disilane Gas at Very Low Pressure;MRS Proceedings;1994
4. Chemical Vapor Deposition of Amorphous Silicon Using Tetrasilane;Japanese Journal of Applied Physics;1993-06-15
5. Low-Temperature Chemical-Vapor Deposition of Amorphous Semiconductors and Insulators;MRS Proceedings;1993-01-01
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