Band offsets of Al2O3 and HfO2 oxides deposited by atomic layer deposition technique on hydrogenated diamond
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4772985
Reference32 articles.
1. Defect structure, distribution, and dynamics in diamond-on-silicon optoelectronic devices
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