X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching
Author:
Affiliation:
1. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA
2. University of California, Berkeley, California 94720, USA
Funder
U.S. Department of Energy (DOE)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/am-pdf/10.1063/1.4960203
Reference15 articles.
1. Gratings with Blaze Angles Down to 0.1° for Photon Energies up to 10 keV
2. Design of soft x-ray gratings for free electron lasers: from specification to characterization
3. Fabrication of extreme-ultraviolet blazed gratings by use of direct argon-oxygen ion-beam etching through a rectangular photoresist mask
4. A plane grating with single-layer coating for the sub-nanometer wavelength range
5. Orientation-Resolved Chemical Kinetics: Using Microfabrication to Unravel the Complicated Chemistry of KOH/Si Etching
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