Microstructure factor and mechanical and electronic properties of hydrogenated amorphous and nanocrystalline silicon thin-films for microelectromechanical systems applications-Reference-Cited by-同舟云学术

Microstructure factor and mechanical and electronic properties of hydrogenated amorphous and nanocrystalline silicon thin-films for microelectromechanical systems applications

Published:2013-11-14 Issue:18 Volume:114 Page:184905
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Mouro J.,Gualdino A.,Chu V.,Conde J. P.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4829020

Reference38 articles.

1. Hydrogenated Amorphous Silicon

2. Amorphous and microcrystalline silicon films grown at low temperatures by radio-frequency and hot-wire chemical vapor deposition

3. Electronic and structural properties of doped amorphous and nanocrystalline silicon deposited at low substrate temperatures by radio-frequency plasma-enhanced chemical vapor deposition

4. High-rate deposition of nano-crystalline silicon thin films on plastics

5. Low temperature growth of microcrystalline silicon and its application to solar cells

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