(311)Asubstrates suppression of Be transport during GaAs molecular beam epitaxy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.104728
Reference10 articles.
1. Ga0.72Al0.28As/Ga0.99Be0.01As heterojunction bipolar transistor grown by molecular beam epitaxy
2. Be redistribution during growth of GaAs and AlGaAs by molecular beam epitaxy
3. Anomalous redistribution of beryllium in GaAs grown by molecular beam epitaxy
4. Beryllium doping and diffusion in molecular‐beam epitaxy of GaAs and AlxGa1−xAs
5. Surface effect‐induced fast Be diffusion in heavily doped GaAs grown by molecular‐beam epitaxy
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1. Electrical characterisation of deep level defects in Be-doped AlGaAs grown on (100) and (311)A GaAs substrates by MBE;Nanoscale Research Letters;2011-02-28
2. Photoluminescence determination of the Be binding energy in direct-gap AlGaAs;Applied Physics Letters;1997-11-24
3. Growth and fabrication of strained-layer InGaAs/GaAs quantum well lasers grown on GaAs(311)A substrates using only a silicon dopant;Journal of Applied Physics;1997-11
4. Is the be incorporation the same in (311)A and (100) AlGaAs?;Microelectronics Journal;1997-10
5. Be doping of (311)A and (100) Al0.24Ga0.76As grown by molecular beam epitaxy;Applied Physics Letters;1996-12-30
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