Film‐edge‐induced stress in silicon substrates
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.89840
Reference6 articles.
1. Effects of surface films and film edges on dislocation movement in silicon
2. Dislocation propagation and emitter edge defects in silicon wafers
3. A method for finding critical stresses of dislocation movement
4. On indentation dislocation rosettes in silicon
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