Impact of surface chemical treatment on capacitance-voltage characteristics of GaAs metal-oxide-semiconductor capacitors with Al2O3 gate dielectric
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2764438
Reference16 articles.
1. Metal-oxide-semiconductor capacitors on GaAs with high-k gate oxide and amorphous silicon interface passivation layer
2. Unpinned metal gate/high-κ GaAs capacitors: Fabrication and characterization
3. Metal gate-HfO/sub 2/ MOS structures on GaAs substrate with and without Si interlayer
4. High mobility NMOSFET structure with high-/spl kappa/ dielectric
5. Enhancement-Mode GaAs n-Channel MOSFET
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